Electrical Resistivity of Diamond Films Grown by Thermal Plasma CVD
نویسندگان
چکیده
منابع مشابه
Electrical characterization of CVD diamond thin films grown on silicon substrates
Diamond thin films grown on high resistivity, (100) oriented silicon substrates by the hot filament chemical vapor deposition (HFCVD) method have been characterized by four-point probe and current-voltage (through film) techniques. The resistivities of the as-grown, chemically etched and annealed samples lie in the range of 1 O* fl cm to 10’ 0 cm. The Raman measurements on these samples indicat...
متن کاملSuperconductivity in CVD diamond films.
A beautiful jewel of diamond is insulator. However, boron doping can induce semiconductive, metallic and superconducting properties in diamond. When the boron concentration is tuned over 3 × 10(20) cm(-3), diamonds enter the metallic region and show superconductivity at low temperatures. The metal-insulator transition and superconductivity are analyzed using ARPES, XAS, NMR, IXS, transport and ...
متن کاملInfrared Photodetectors Grown by Rapid Thermal Cvd
GeSii infrared detectors grown by Rapid Thermal CVD are demonstrated. External quantum efficiency of7% at A=1.32jtm and eye-diagram at 1.5Gbit/s are obtained for Ge2Si71 waveguide pin detectors. It is shown that external quantum efficiency is limited by the fiber to waveguide coupling efficiency. These, along with system considerations suggest that with further improvements, such devices can be...
متن کاملAnalysis of the Surface Morphology of Cvd-grown Diamond Films with X-ray Diffraction
In this study the influence of the addition of nitrogen during growth of diamond films is determined using small-spot X-ray diffraction techniques and compared with the morphological structure. Phase identification showed the presence of crystalline molybdenum carbide at the interface, as well as the incorporation of a small amount of non-diamond carbon throughout the diamond layer. The pole fi...
متن کاملNovel Diamond Films Synthesis Strategy: Methanol and Argon Atmosphere by Microwave Plasma CVD Method Without Hydrogen
Diamond thin films are grown on silicon substrates by only using methanol and argon mixtures in microwave plasma chemical vapor deposition (MPCVD) reactor. It is worth mentioning that the novel strategy makes the synthesis reaction works smoothly without hydrogen atmosphere, and the substrates temperature is only 500 °C. The evidence of surface morphology and thickness under different time is o...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of the Ceramic Society of Japan
سال: 1991
ISSN: 0914-5400,1882-1022
DOI: 10.2109/jcersj.99.1201